Table 3. Percentage contributions of inter­atomic contacts to the Hirshfeld surface for the O1-mol­ecule, the O4-mol­ecule and for overall (I).

Contact	Percentage contribution
	O1-mol­ecule	O4-mol­ecule	(I)
H⋯H	49.5	49.4	48.7
O⋯H/H⋯O	16.4	17.5	17.8
N⋯H/H⋯N	7.4	7.3	7.7
C⋯H/H⋯C	26.3	25.7	25.5
C⋯C	0.1	0.1	0.1
O⋯O	0.2	0.0	0.1
C⋯O/O⋯C	0.1	0.0	0.1