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. 2018 Jan 24;8:1486. doi: 10.1038/s41598-018-20035-7

Table 1.

Substrate material, film thickness (d), nanowire linewidth (w), space (s), switching current (Isw), switching current density (Jsw), and minimum hotspot relaxation time (τth)min for the seven SNSPDs.

Sample Substrate material d (nm) w (nm) s (nm) Isw (μA) Jsw (MA/cm2) (τth)min (ps)
#1 MgO (100) 5.5 90 110 33 6.7 11.6 ± 0.1
#2 MgO (100) 5.5 105 110 40 6.9 12.2 ± 0.1
#3 MgO (100) 5.5 120 110 51.5 7.8 12.6 ± 0.1
#4 MgF2 (110) 4.5 90 110 22 5.4 19.7 ± 0.1
#5 Al2O3 (0001) 7 130 70 21.5 2.4 22.5 ± 0.7
#6 SiO2/Si (100) 7 90 110 21 3.3 22.7 ± 0.1
#7 Si (100) 7.5 90 110 19 2.8 34.5 ± 0.3