Figure 11.

Important steps in the standard electrolithography process. a) Electromigration‐driven metal etching by a traversing probe. As the negatively biased tip moves, the Cr compound formed below the cathode melts and flows away from the path, which creates a groove along the path traversed. The dashed arrow shows the direction in which the tip is traversed. b) Process flow of the standard electrolithography technique. The process starts with a substrate spin coated with a polymer followed by deposition of a Cr thin‐film top layer. 1) In the first step, the top Cr layer is etched in the desired pattern by using electromigration. 2) Next, the polymer is etched in the patterned region by dipping it in an appropriate solvent. The inset shows the zoomed view of the trench made in the polymer. 3) Subsequently, the desired material is deposited. 4) Lift off is used to transfer the final pattern onto the desired material. Reproduced from Ref. 48 with permission of Nature Publication Group.