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. 2018 Feb 2;8:2241. doi: 10.1038/s41598-018-20714-5

Table 5.

The final PLA concentration and obtained surface tension of the solutions after plasma treatment and Ar-bubbling with various exposure times (treatment condition: 0.5 lmin−1, 2 kV, 6% w/v).

PLA concentration (w/v %) Tplasma (min) Tbubbling (min) Plasma treatment Ar-bubbling
Surface tension (mN/m) Surface tension (mN/m)
6 0 0 30.4 ± 0.08 30.4 ± 0.08
6.6 1 2.5 31.1 ± 0.08 30.7 ± 0.09
6.9 3 5 31.3 ± 0.05 30.7 ± 0.10
7.1 5 9 31.5 ± 0.09 29.8 ± 0.12
7.4 7 12 31.7 ± 0.07 30.5 ± 0.09
7.6 9 15.5 32.1 ± 0.10 30.9 ± 0.11