Table 5.
The final PLA concentration and obtained surface tension of the solutions after plasma treatment and Ar-bubbling with various exposure times (treatment condition: 0.5 lmin−1, 2 kV, 6% w/v).
PLA concentration (w/v %) | Tplasma (min) | Tbubbling (min) | Plasma treatment | Ar-bubbling |
---|---|---|---|---|
Surface tension (mN/m) | Surface tension (mN/m) | |||
6 | 0 | 0 | 30.4 ± 0.08 | 30.4 ± 0.08 |
6.6 | 1 | 2.5 | 31.1 ± 0.08 | 30.7 ± 0.09 |
6.9 | 3 | 5 | 31.3 ± 0.05 | 30.7 ± 0.10 |
7.1 | 5 | 9 | 31.5 ± 0.09 | 29.8 ± 0.12 |
7.4 | 7 | 12 | 31.7 ± 0.07 | 30.5 ± 0.09 |
7.6 | 9 | 15.5 | 32.1 ± 0.10 | 30.9 ± 0.11 |