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. 2018 Feb 16;8:3204. doi: 10.1038/s41598-018-21420-y

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Atomic force micrographs of (a) InAs microribbon, (b) SANE photoresist pattern on InAs microribbon (inset: SEM and AFM images of 50-nm PR lines), (c) InAs NWs (inset: SEM and AFM images of 35-nm InAs NWs), (d) Transmission electron micrograph of the InAs NWs transferred onto Si/SiO₂.