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. 2018 Feb 20;13:56. doi: 10.1186/s11671-018-2463-z

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© The Author(s). 2018

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 2 — Preparation of solid-state nanopore by mask etching methods. (a) GaAs solid-state nanopore [25], (b) silicon nanopore [33], and (c) aluminum nanopore with different shapes [34]