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. 2018 Feb 20;8:3365. doi: 10.1038/s41598-018-21493-9

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Characterization of the 10 s brushing LbL method by thickness measurement, QCM analysis, and contact angle measurement. (a) Thickness growth curves of the (CHI/ALG + micelle blend)_n multilayer films up to n = 50. Inset: Comparison of the dipping and brushing methods for 20 bilayers. (b) QCM analysis of the multilayer films up to 14 layers fabricated by the brushing LbL method. (c) Static contact angles measurements depending on the alternating outermost layer of the films fabricated by the brushing LbL method. For (b) and (c), the odd number of layers named as CHI represent chitosan layer and the even number of layers named as ALG represent the ALG + micelle blend outer layers, respectively.