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. Author manuscript; available in PMC: 2018 Aug 8.
Published in final edited form as: Chem Mater. 2017 Jul 12;29(15):6279–6288. doi: 10.1021/acs.chemmater.7b01367

Figure 6.

Figure 6

θ-2θ XRD scans from a thick MoS2 films (≈25 nm, n=200) grown at 591 °C. Absence of the hkl reflections other than from the {0002} family is evidence for 0002 texture in the film. A high degree of texture is also evident from a relatively narrow rocking curve shown in the inset, which shows an integrated intensity for the 0002 reflection vs χ-angle produced from the XRD2 diffraction (not shown). Reflections identified with a star (★) on the θ-2θ scan are from the Si (100) substrate. The lattice parameter is calculated as c = 1.2306(5) nm.