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(a) Schematic of the in situ ATR-FTIR spectroscopy setup equipped with a liquid flow cell. An undoped silicon wafer is used as the internal reflection element. (b) Schematic of the solid-liquid interface for the surface reactions to form MOF thin films. A layer of ZnO deposited on Si using ALD is used as a templating material for rapid room-temperature synthesis of the HKUST-1 thin film.
