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. 2018 Mar 13;8:4410. doi: 10.1038/s41598-018-22200-4

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fabrication of perforated nanomembranes. (a) Illustration of the fabrication procedure: (1) Sacrificial layer casting onto polished silicon wafer. (2) Coating of the nanomembrane casting solution containing PEI, PCGF and PLGA dissolved in chloroform onto sacrificial layer. (3) Baking step to crosslink thermoset resin component. (4) Selective dissolution of PLGA by immersion into chloroform to create perforations in the continuous nanomembrane matrix. (5) Immersion into water releasing the nanomembrane from the wafer onto the water surface. (b) Schematic of phase separation events occurring during spin coating illustrated at several points in time. (c) Chemical structures of the polymers used for nanomembrane fabrication: Thermoset resin constituents poly[(o-cresyl glycidyl ether)-co-formaldehyde] (PCGF) and branched polyethyleneimine (PEI) comprise the nanomembrane matrix, poly(D,L-lactide-co-glycolide) (PLGA) acts as phase separating porogen and polystyrene sulfonate (PSS) is used as a water soluble sacrificial layer.