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. 2018 Mar 2;9:780–788. doi: 10.3762/bjnano.9.71

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Copyright © 2018, Chen et al.

This is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)

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Emission pattern averaged over multiple emitters. (a) Schematic of the three emitter positions inside the gap between the two bars, used to evaluate the average effects. (b, c) Polar plot of the total (P₀) and azimuthal component (P_θ) of the far-field power distribution, after averaging over all three positions. (d) Schematic of the nine emitter positions used in simulations. (e, f) Polar plot of the total (P₀) and the azimuthal (P_θ) components of the far-field power distribution, after averaging over all the nine positions.