Fig. 1.

Schematic of self-scrolling of chemical vapor deposition (CVD)-based transition metal dichalcogenide (TMD) monolayer flakes. A proposed series of steps leading to the formation of TMD-NSs is shown: (I) initial TMD monolayer growth on a substrate at a high temperature (HT) (e.g., 720, 825 °C); (II) the generation of a strain, balanced with the adhesion from substrate, in the TMD monolayer while cooling down to room temperature (RT); (III) the insertion of liquid between the TMD monolayer and substrate and the disappearance of the adhesion; (IV) the TMD flakes curve out of the plane driven by the strain; (V) the final formation of TMD-NSs