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. Author manuscript; available in PMC: 2018 Apr 11.
Published in final edited form as: ACS Nano. 2017 Jul 7;11(7):7494–7507. doi: 10.1021/acsnano.7b04031

Figure 1.

Figure 1

Schematic of antidot fabrication steps in few-layer black phosphorus. (a) Exfoliation and O2 plasma thinning of bulk BP on a SiO2/Si substrate yields (b) a PxOy-capped few-layer BP flake. (c) After the sample is coated in resist, antidot arrays are patterned using electron beam lithography and etched in CF4 to remove the exposed PxOy/BP. (d) Finally, the process yields a PxOy-passivated few-layer BP antidot lattice. Typical superlattice constants and antidot radii are 60–65 nm and 13–23 nm, respectively.