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. 2018 Apr 17;12:65–77. doi: 10.2174/1874091X01812010065

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© 2018 Rescigno et al.

This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 International Public License (CC-BY 4.0), a copy of which is available at: (https://creativecommons.org/licenses/by/4.0/legalcode). This license permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

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Fig. (1) — Description of ELF MF exposure system. Panel A shows the schematic geometry of multiwells used in a simulation model. Panel B shows a computer modeling of the magnetic field between coils, with arrows indicating magnetic field (H) strength and direction, demonstrating a constant distribution within whole multiwell plate. Panel C shows a picture of the exposure system with the Plexiglass holder keeping multiwell plate between coils.