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. 2018 Apr 10;19(1):336–369. doi: 10.1080/14686996.2018.1433439

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© 2018 The Author(s). Published by National Institute for Materials Science in partnership with Taylor & Francis

This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Figure 24. — Time evolution during monoatomic Ar⁺ etching of the XPS area of the peaks related to the elements constituting of the InGaAs/GaAsP multilayer stack.