Table 1. Summary of the beamline hardware for MX2.
| Beamline name | Micro Crystallography – MX2 |
| Source type | U22 undulator |
| Total length | 3 m |
| Period | 22 mm |
| Minimum gap | 6.6 mm |
| Peak field @ minimum gap | 0.85 T |
| K max | 1.75 |
| Monochromator | Double-crystal Si(111) liquid nitrogen cooled (DC) or channel-cut Si(111) liquid nitrogen cooled (CC) |
| Energy range (keV) | |
| User controlled (DC) | 8.0–15.5 |
| Full range available (DC) | 6.5–18.0 |
| User controlled (CC) | 12.0–13.5 |
| Wavelength range (Å) | |
| User controlled (DC) | 1.55–0.80 |
| Full range available (DC) | 0.69–1.91 |
| User controlled (CC) | 0.92–1.03 |
| Mirrors | Three Si mirrors with Rh and Pt stripes; one vertical focusing (VFM), one horizontal focusing (HFM) and one horizontal microfocusing (MHFM). All mirrors operate at or close to 2.8 mrad incident angle. |
| Beam size, without apertures (FWHM) (H × V) µm | 22 × 12 µm |
| Photon flux (at 13 keV) | |
| Full beam | 3.4 × 1012 photons s−1 |
| 20 µm aperture | 5.1 × 1011 photons s−1 |
| 10 µm aperture | 2.0 × 1011 photons s−1 |
| 7.5 µm aperture | 1.4 × 1011 photons s−1 |
| Goniometer | Horizontal air-bearing |
| Cryo capability | CryoJet 5 |
| Pixel detector† | EIGER X 16M (Dectris Ltd, Switzerland) |
| Fluorescence detector | Vortex Si-drift detector (Hitachi High-Technologies Science America, Chatsworth, CA, USA) |
| Sample mounting | SAM system |
†
From February 2017.