Fig. 2.

(a) Dissolution behavior of Mo thin film in DI water and Hanks' solutions with various pH, at both room temperature and 37 °C, with the solid lines representing the modeling dissolution behavior; (b) TEM characterization of Mo thin film after dissolution in DI water for 40 hours; (c) Optical images of dissolution of CMOS array at various stages on the rice paper in DI water at 37 °C; (d) Dissolution kinetics of metal foils in phosphate buffered solutions (pH 7.4, 37 °C); (e) Optical images of sublimation of the CDD substrate and self-destruction of the electronics after 1, 4, 10, and 12 days at 60 °C. Reprinted with permissions from Refs. [[28], [29], [30], 34].