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. 2018 Mar 23;4(3):eaap9096. doi: 10.1126/sciadv.aap9096

Fig. 3. Growth mechanism of the WS2 quantum well in WSe2.

Fig. 3

Atomic models of (A) 5|7 dislocation at the WS2/WSe2 interface due to lattice mismatch, (B) dislocation climbs one unit cell into WSe2 by inserting a W atom and an S2 pair, (C) substitution of Se by S in pentagon of the 5|7 dislocation, and (D) subsequent substitution of Se atoms next to the 5|7 dislocation by S resulting in a four–unit cell–wide WS2 nanoseed. (E) Energy barrier for SSe substitution under different levels of compressive strain. (F) Strain mapping based on bond length analysis for the atomic model in (B). See Materials and Methods for details. The green dashed line indicates the WS2/WSe2 interface. (G) Structural model showing a short WS2 strip four unit cells wide and six unit cells long after repeating the insertion-substitution process six times.