Figure 2.

Tennant’s scaling: state-of-the-art of nanotechnology in 2003 for the resolution vs. throughput R=2.3⁵ T_2D (Ref. 27). Direct 3D laser writing for polymerization²⁸ with T ≃ 10⁹ μm³ h^–1, Bragg grating recording by Bessel–Gauss fs-beam in glass¹⁴, surface ripple formation on crystals/glasses²⁹ are marked along with the Tennant’s law predictions rescaled for the 3D C × 10⁶ μm³ h^–1 with C=32.2 taken from the speed of protein production in ribosome³⁰ (see text for details). The size of elliptical markers is representative of the resolution span; the current 22 nm node of modern CMOS lithography is marked by an arrow.