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. 2018 Jun 27;8:9765. doi: 10.1038/s41598-018-28136-z

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Laser thinning of freestanding SiN_x. (a) Schematic of the confocal setup. SC- SiN_x chip; PS-piezo stage OL- objective lens; DM- dichroic mirror; LP- long pass filter; TL- tube lens PH- pinhole. The emission pathway is switchable between the APD and EMCCD. (b) Focusing of a ~45 mW 488 nm laser on the membrane results in photoluminescence emission, which is recorded by the APD in the >550 nm range. (c) Photoluminescence emission during laser-exposure, measured in counts per second. The laser is activated at t = 0 seconds. (d) Images of the 42 × 42 μm² membrane under white-light illumination before etching (i). After 300 seconds of laser exposure, a thin region is visible as a contrasted spot (ii).