Skip to main content
. 2018 Jun 16;8(6):442. doi: 10.3390/nano8060442

Figure 2.

Figure 2

Schematic side view cross-sections through nanowire showing the fabrication technologies employed. (a) Fabrication by negative resist, electron-beam lithography (EBL) and reactive ion etching (RIE). (b) Nanowire cut-out using positive resist, EBL and RIE. (c) Nanowire definition by neon focussed ion-beam milling (Ne-FIB).