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. Author manuscript; available in PMC: 2018 Jul 4.
Published in final edited form as: Plasma Sources Sci Technol. 2018 Mar 14;27:035007. doi: 10.1088/1361-6595/aab185

Figure 2.

Figure 2

Left panel: Photograph of an a-C:H sample deposited on a Si substrate. Central panel: SEM image of the cross section of a deposited a-C:H film. Right panel: SEM image (planar view) of dust particles generated in the gas-phase of the plasma and collected on the sample.