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. 2018 Jul 6;8:10239. doi: 10.1038/s41598-018-28348-3

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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A proposed mechanism for the development of the porous SiO₂ morphology. (a) Exposure of a Mo₃Si A15 phase to O₂ at a high temperature results in the formation of SiO₂ and MoO_x and the evaporation of gaseous MoO₃. (b) Porous silica structure starts to develop due to the formation of voids formed after the evaporation MoO₃. Some MoO₂ islands also form due to the low O₂ concentration in silica. (c) The Mo₃Si A15 phase is fully oxidized, accompanying with the depletion of Mo and the complete formation of porous silica.