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. 2018 Jul 13;4(7):eaat3151. doi: 10.1126/sciadv.aat3151

Fig. 1. STM images on the Pt3Ni(111) surface in UHV or ambient pressure condition at 300 K.

Fig. 1

(A) Formation of a topmost Pt-skin layer after several cycles of Ar+ sputtering, followed by annealing at UHV and 1100 K (Vs = 0.32 V; It = 0.25 nA). (Inset) Atom-resolved STM image of the Pt-skin layer (Vs = 0.20 V; It = 0.20 nA). (B) CO adsorption on the terrace of the Pt-skin layer under 120 mtorr of CO (Vs = 0.45 V; It = 0.21 nA). (C) Disintegrated step and terrace structures of the Pt-skin layer under 135 mtorr of O2 (Vs = 1.40 V; It = 0.31 nA). (D) Evolution of the interfacial Pt-NiO1−x structure under 120 mtorr of mixed CO/O2 (1:5 ratio) (Vs = 1.25 V; It = 0.22 nA).