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. 2018 Aug 10;9:3207. doi: 10.1038/s41467-018-05671-x

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 2 — Design and analysis of a scattering layer. a, b Calculated (a) asymmetry parameter (g) and (b) logarithm of the scattering efficiency (Q_sc) of a scattering layer at the wavelength (λ) of 532 nm according to the diameter (d_SP) and refractive index (n_SP) of a scattering particle (SP) in the host (NOA 73, n_SL ∼ 1.57). c A scanning electron microscope image of a fabricated SiO₂-based scattering layer (scale bar: 5 μm). d Photographs of glass without a scattering layer and with a scattering layer (SL) fabricated using 3 wt.% solution. e Measured (dot) and fitted (dashed) graphs of angular characteristic of scattered light after passing through SiO₂ embedded scattering layers. 532 nm-laser was used for the measurement