FIGURE 6.

Sssfh1-silenced strains show increased tolerance to osmotic and oxidative stresses. (A) Representative pictures showing that RNAi strains are more tolerant to osmotic and oxidative stresses. Both WT and RNAi strains were inoculated on PDA media that was supplemented with sequential concentrations of oxidative and osmotic reagents, in which H₂O₂ (5, 15, and 25 mM) was used to generate oxidative stress and 1 M NaCl was used to mimic osmotic stress environment. Photographs were taken after incubation at 25°C for 3 days. (B) The colony diameters of different strains in A. Each data point represents the means ± SD from three biological repeats (n = 3).