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. 2018 Jul 4;7:29. doi: 10.1038/s41377-018-0027-8

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 3 — a Schematic showing a patterned plasmonic patch, which selectively enhances the fluorescence in the regions of conformal contact. In all of the used patterns, the height of the surface-relief portions is >200 nm. SEM image of a (b) stripe array and (c) square lattice PDMS with Au@Ag-490 adsorbed (insets show zoomed-in SEM images of the highlighted area revealing a uniform distribution of the plasmonic nanostructures on both elevated and surface-relief regions; inset scale bars represent 500 µm). AFM images of (d) stripe array (z scale: 430 nm) and (e) square lattice (z scale: 200 nm) plasmonic patches revealing the height profile of the surfaces. Fluorescence images of an FITC-coated silicon surface with (f) stripe array and (g) square lattice plasmonic patches on top. The plots below reveal the fluorescence intensity profiles. h Fluorescence map of FITC with a plasmonic patch (with Au@Ag-490 adsorbed) with circular pores. i Fluorescence image (CW800) of the “Washington University in St. Louis” logo obtained using a plasmonic patch (with AuNR-760 adsorbed) with an engraved logo