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(A) AFM surface topographies of PDA-NaIO4-20mM films on silicon wafers as a function of the reaction time. (B) Underwater contact angles of CHCl3 (left) and water contact angles (right) for PDA-O2-2 h (left) and PDA-NaIO4-20 mM-2 h (right) films. (C) Adsorption of BSA-FITC on PDA-O2-2 h (left) and PDA-NaIO4-20 mM−2 h (right). Reproduced from Ponzio et al. (2016) with authorization.
