Fig. 2.
Device 1 Fraunhofer evolution. a Evolution of the Fraunhofer patterns for device 1. b Fraunhofer evolution for device 1 that has been rotated so that the lobe minima are vertical, making it easier to compare across samples. There is a side branch feature that develops as By is applied to the junction, which can be quantified as a line with slope m (dashed line). Black dots mark approximate locations of minimum resistance at different side lobes as a guide to the eye
