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. 2018 Aug 28;9:3484. doi: 10.1038/s41467-018-05723-2

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 2 — Scalable production of large-area highly aligned and compact GO films with different thickness. a, b A meter-scale ~10 μm-thick free-standing GO film (a) and thin GO film on polyethylene terephthalate (PET) (b) produced with a RHT of 33 cm in inner diameter. c A thin GO film on a 4 inch silicon wafer prepared with the same conditions as those for the production of the film in b. d, e Atomic force microscopy (AFM) image (d) of the film in c and the height profiles (e) along the three lines in d, showing the thickness of ~50 nm. Scale bars: b 10 cm; d 1 μm