Table 2.
Summary of several approaches for defects modulation in graphene crystals.
Approaches | Key Content | Substrate | Induced Disorders | Refs. |
---|---|---|---|---|
Particle Irradiation | Ar+ ions | Bilayer graphene | Interstitials and vacancies | [326] |
Ar+ ions | SiO2-supported monolayer graphene | Vacancies and substitutional Impurities |
[336] | |
-beams (He2+) |
Monolayer graphene | Vacancies, C = O and C–OO bonds | [327] | |
Electrons | Monolayer CVD graphene | Vacancies, complex closed-loop defects, and dislocation pairs | [328] | |
Electrons | Mechanically exfoliated monolayer graphene | Polygons and low-energy multivacancy | [339] | |
Thermal Annealing | ~ 200 °C | CVD graphene | sp3 defects and partially formed radical sites | [329] |
500–1000 °C | rGO | Free radicals and oxygen groups | [330] | |
Chemical Reaction | CO and NO molecules | Monolayer graphene after irradiation | SV and N-doping | [331] |
Fluorinated maleimide molecules and a toluene solution | Monolayer and bilayer epitaxial graphene | sp3-defects and standing-wave patterns |
[332] | |
NH3 plasma | Polycrystalline graphene |
Pyridine-like N, pyrrolelike N, and nitrites (NOx) |
[347] | |
Strain Treatment | Uniaxial strain | Polycrystalline graphene | Lattice distortion, Grain boundaries | [333] |
Shear strain | CVD graphene | Wrinkles, transverse conducting channels and grain boundaries | [334] |