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. 2018 Sep 5;8:13268. doi: 10.1038/s41598-018-31485-4

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© The Author(s) 2018

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Operando photoelectron nanospectroscopy results of GaN-HEMT surface under application of both drain and gate biases. (a) Typical Ga 3d spectra under application of drain (30 V) and gate (−5 V) biases. (b) Line profile of the binding energy of the main Ga–N peak under application of drain (30 V) and gate (−5 V) biases. (c) Schematic band diagrams corresponding to (left) absence of surface electron trapping, and (right) occurrence of surface electron trapping. (d) Simulations utilized to reproduce the experimental data by assuming surface electron densities. (e) Estimated local electric field distribution under application of gate (−5 V) and drain (30 V) biases.