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. 2018 Sep 17;8:13907. doi: 10.1038/s41598-018-31915-3

Table 1.

Summary of the growth conditions and surface morphology of the Fe3O4 films obtained by AFM.

Sample Structure Post Anneal. RMS (nm) Peak -to- Valley height (nm) Grain diameter (nm) Method
A Fe3O4[4]/MgO(100) X 0.42 ± 0.01 3.5 ± 0.1 32.0 ± 1.0 Oxide-MBE
A1 Fe3O4[4]/MgO(100) 300 °C, 3 hours 0.70 ± 0.03 6.4 ± 0.1 39.0 ± 2.0 Oxide-MBE
B Fe3O4[6]/MgO(100) X 0.52 ± 0.02 5.7 ± 0.7 37.0 ± 1.0 Oxide-MBE
B1 Fe3O4[6]/MgO(100) 300 °C, 3 hours 0.73 ± 0.02 6.8 ± 0.2 40.0 ± 1.0 Oxide-MBE
C Fe3O4[40]/MgO[5]/Ta[5]/SiO2/Si(100) 400 °C, 2 hours 1.10 ± 0.01 12.0 ± 1.3 42.0 ± 3.0 RF-magnetron sputtering

The numbers in brackets represent the thickness of the respective layers in nm.