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Classes of microscale implantable neural technologies: (a) 50 μm polyimide-insulated tungsten microwire with chiseled tips (Tucker–Davis Technologies, Alachua, FL, USA); (b) microfabricated silicon Michigan array with iridium electrode sites (NeuroNexus Technologies, Ann Arbor, MI, USA), scale = 100 μm; (c) macromachined boron-doped silicon array (Blackrock Microsystems, Salt Lake City, UT, USA), each needle is electrically separated at the base with glass. Scale = 400 μm.
