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Parameters for photoresist spin curves on different surfaces.
| AZ P4620 | AZ 5214E-IR | |
|---|---|---|
| Surfaces | Silicon, Parylene-coated silicon, glass (100 mm wafers) | |
| Pre-spin | 500 rpm for 5 s | 500 rpm for 8 s |
| Spin acceleration | ~1000 rpm/sec | |
| Main spin | 1000, 2000, 3000, 4000, 5000 rpm for 45 s | |
| Bake | 5 min at 90 °C | 70 s at 90 °C |
