Table 3.

Relevant work on micromirrors with electrothermal actuators.

Reference	Year	Size (in mm)	Characteristics	Operating Conditions	Natural Frequency
Buser et al. [104]	1992	-	8°	180 mW	-
Buhler et al. [105]	1995	0.035 × 0.04	4.5°	-	-
Schweizer et al. [101]	1999	-	90°	1 mW	330 Hz
Schweizer et al. [100]	2000	-	30°	5 mW	220 Hz
Pan et al. [106]	2001	-	15°	-	165 Hz
Xie et al. [38]	2002	1 × 1 mirror	32° optical	12 mA	-
Xie et al. [128]	2003	1 × 1 mirror	35° optical	7 mA	-
Xie et al. [116]	2003	1 × 1 mirror	32° optical	12 mA	165 Hz
Xie et al. [118]	2003	1 × 1 mirror	37° optical	7 mA	-
Jain et al. [119]	2004	1 × 1 mirror	64° and 33° (2R)	8 mA	259 Hz
Jain et al. [123]	2005	0.7 × 0.32 (0.19 mirror)	26.5°, ±15, 200 μm	6 V	1.18 kHz
Todd et al. [127]	2006	0.5 × 0.5 mirror	56 μm	-	-
Jiang et al. [107]	2006	50 μm cantilever	300 nm	0.2 V	117 kHz
Henneken et al. [99]	2006	2 mm length	13 μm	45 V	-
Jain et al. [125]	2006	0.5 × 0.5 mirror	±30° (2R), 500 μm	12 V	170 Hz
Singh et al. [110]	2008	1 × 1	17°, 250 μm	2 V	-
Xu et al. [112]	2008	2.5 × 2.5	17° mech.	1.5 V	46 Hz cut-off
Wu et al. [126]	2008	2.5 × 2.5	0.7° tilt, 620 μm	5.3 V	500 Hz
Jia et al. [124]	2009	1 × 1 mirror	±30° (2R), 480 μm	8 V	336 Hz
Premachandran et al. [111]	2009	1.5 × 1.5 chip	16°	-	-
Wang et al. [113]	2010	1.5 × 1.5	11°	1.2 V	60 Hz
Sun et al. [121]	2010	-	30° (2R), 600 μm	5.5 V	13 Hz
Mu et al. [115]	2011	1 mm dia. mirror	11°	1.4 V	75 Hz
Pal et al. [109]	2011	1 mm dia. mirror	60° (2R)	0.6 V	104 Hz
Liu et al. [120]	2011	1.5 × 1.5	±16° (2 layer flip)	3.6 V	659 Hz
Izhar et al. [122]	2011	4.5 die 1.3	32° optical, 131 μm	12 mW	10.5 Hz cut-off
Liu et al. [103]	2012	2 × 2	±11°, 227 μm	0.6 V	197 Hz