Table 8.
Piezoresistor | G/E ratio | Nominal resistance | Fabrication steps to realize the piezoresistor | Issues/features | References |
---|---|---|---|---|---|
Metal | 0.4 | 500 Ω–1.5 kΩ | Sputtering/thermal evaporation |
Higher rate of joule heating Plastic deformation of the cantilever Reduced SNR Electro-migration effect in resistors Adhesion of metal with SU-8 |
[68, 87, 226, 229, 231] |
Polysilicon | 4.0 | 100–200 kΩ | HWCVD |
High dependence of electrical properties of poly-Si on process parameters Higher stiffness compared to metal piezoresistor Adhesion of poly-Si with SU-8 |
[217, 230, 260] |
CB SU-8 | 4.0 | 185–550 kΩ | Spin coating |
Higher gauge factor, low-temperature process Lower residual stress Dependence of mechanical properties on CB loading Electrical resistivity variation due to CB dispersion issues |
[67, 192, 233, 250] |