Table 4.
Sensing material | Structure of sensor | Target gas | T res(s) | LOD | T rec(s) | Ref. |
---|---|---|---|---|---|---|
Pt/RGO/SiC | FET | H2 | 300 | Voltage shift of ≈100 mV for 1 % H2 (100 °C) | – | [145] |
GR/Pt | Chemiresistor | H2 | 540 | 16 %/4 vol% | – | [140] |
Multilayered GR/Pd nanoribbon | Chemiresistor | H2 | 21 | 55 %/40 ppm | 23 | [146] |
GR/Pt | Chemiresistor | H2 | 700 | 1 % concentration (175 °C) | 700 | [141] |
GR/Pt | Chemiresistor | H2 | 120 | 80 %/1 % concentration | 1200 | [142] |
GR/(Pt + Pd) | Chemiresistor | H2 | <2 | 2 % concentration (40 °C) | 18 | [143] |
GR/Pd | Chemiresistor | H2 | – | 1 % concentration | – | [147] |
GR/Pd | Chemiresistor | H2 | 900 | 20 ppm | 1800 | [148] |
GR | First-principle calculation | H2 | – | – | – | [149] |
RGO/TiO2/(Pd + Pt) | Chemiresistor | H2 | 18 | 92 %/500 ppm (180 °C) | 29 | [150] |
RGO/SnO2 + Pt | Chemiresistor | H2 | 5 | 1 % concentration | 4 | [151] |
RGO/Pd | Chemiresistor | H2 | – | 0.20 % | – | [152] |
GR with mono-atom-vacancy | First-principle calculation | H2 | – | 10−35 mol L−1 | – | [144] |
RGO/Pd | Chemiresistor | H2 | 1200 | 0.4 %/0.2 ppm | 900 | [153] |
GO | Chemiresistor | H2 | 270 | 6 %/800 ppm | 306 | [154] |
PMMA/Pd NPs + SL GR | Chemiresistor | H2 | 108 | 66 %/2 % | 330 | [155] |
GR/SnO2 NPs | FET | H2 | 1.2 | 3/100 ppm | 1.6 | [156] |
GO/PEDOT:PSS | Chemiresistor | H2 | 30 | 4.2 %/100 ppm | 25 | [157] |
RGO reduced graphene oxide, GR Graphene, PMMA Polymethylmethacrylate, NPs Nanoparticles, SL Single layer