Table 1.

Performance Parameters of Our Solid-State EC Devices in Comparison with That of Solid-State Devices Reported in the Literature

Counter Electrode Material	Phase	Deposition Method	ΔT (%)	tcolor (s)	tbleach (s)	CE (cm2/C)	Reference
NiO porous film	Crystalline	Chemical bath deposition	55	10	20	87.2	Zhang et al., 2009a
NiO nanoparticle film	Crystalline	Inkjet printing	75	10	13	131.9	Cai et al., 2016ab
NiOx film	Crystalline	Magnetron sputtering	52	5	2	–	Liu et al., 2016c
NiOxfilm	Amorphous	Photodeposition	60	4	6	141	this workd
NiOxfilm	Crystalline	Photodeposition	26	78	17	72	this workd

All devices use WO₃ as the electrochromic layer, NiO_x as the counter electrode, and a polymer-based electrolyte.

^aMeasured at 633 nm over the −2.5 to +2.5 V potential range.

^bMeasured at 550 nm over the −2.5 to +2.5 V potential range.

^cMeasured at 550 nm over the −1.8 to +1.8 V potential range.

^dMeasured at 633 nm over the −2.1 to +2.1 V potential range.