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. 2018 Dec 15;8(12):1058. doi: 10.3390/nano8121058

Figure 4.

Figure 4

Dependences of sheet resistance and figure of merit (FOM) (λ = 1500 nm) on the deposition rate of thin copper films (25 nm thick) deposited on SiO2/Si substrates with (diamonds) and without (circles) graphene.