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. 2019 Feb 21;9:2461. doi: 10.1038/s41598-019-39660-x

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© The Author(s) 2019

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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(a) Variation of saturated magnetic moment per cm³ and bound magnetic polarons concentration at various Cu doping from 0.05% to 10%. Connecting lines are guide for eyes. Horizontal line indicates the percolation threshold for bound magnetic polarons in the hexagonal wurtzite ZnO. (b) M–H curve fitted with BMP model. Symbols are for experimental data and the solid red line is a fit with BMP model. (c) Magnetization curves and (d) EPR spectra of 2% Cu-doped ZnO films grown at different Ar/O₂ ratio.