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. Author manuscript; available in PMC: 2019 Mar 14.
Published in final edited form as: J Phys D Appl Phys. 2016 Aug 9;49(36):10.1088/0022-3727/49/36/364002. doi: 10.1088/0022-3727/49/36/364002

Figure 1. Obstacle masks and equilibration criteria.

Figure 1

(A) A 2000 × 2000 pixel detail of an obstacle mask used for simulations to determine DON at C = 0.22. (B) Fraction of tracers bound to obstacles as a function of equilibration time t. (C) Obstacle mask used for simulations to determine the ratio of tracer density ρON/ρOFF. (D and E) Surface densities of tracers outside the obstacle field ρOFF (dark gray), inside the obstacle field ρON (black) and in the accessible area of the obstacle field ρON,acc (light gray) plotted as a function of equilibration time t for inert (D) or sticky (E) obstacles at C = 0.22. (F) Schematic representation of the relationship between simulated steps, tdelay and tlag.