| a-Si:H | Amorphous Silicone and Hydrogen composition |
| CIGS | Copper indium gallium selenide |
| DNA | DeoxyriboNucleic Acid |
| DLC | Diamond-like carbon |
| D | Dimension |
| DC | Direct current |
| DSSC | Dye-sensitized solar cell |
| F-DLC | Fluorinated DLC |
| FIB | Focused ion beam |
| GDL | Gas diffusion layer |
| HT | Head tail |
| HMDSO | Hexamethyldisiloxane |
| HOPG | Highly oriented pyrolytic graphite |
| HSQ resist | Hydrogen silsesquioxane resist |
| ICP | Inductively coupled plasma |
| ICP-MS | ICP-mass spectrometry |
| IB | Ion beam |
| MD | Molecular dynamic |
| NG | Natural graphite |
| NR-7, SU-8 | Negative Resist |
| OSA | Oil sliding angle |
| PC | Polycarbonate |
| PECVD | Plasma enhance chemical vapor depostion |
| PIII&D | Plasma immersion ion implantation and deposition |
| PES | Polyethersulfone |
| PET | Polyethylene terephthalate |
| PLLA/PLGA | Poly- l-lactic acid/Poly(Lactide-co-Glycolide) |
| PMMA | Poly(methyl methacrylate) |
| PS/PI | Polystyrene/Polyimide |
| PS- b-PDMS | Polystyrene- b-polydimethylsiloxane |
| PS- r-PDSS | Random copolymers of polystyrene and 4-pentamethyldisilylstyrene |
| PVA | Polyvinil acrylate |
| PDMS/PTFE | Polytetrafluoroethylene/Polydimethylsiloxane |
| RF | Radio frequency |
| RgGs | Rabbit γ-Globulins |
| RIE | Reactive ion etching |
| TEM | Transmission electron microscopy |
| UHV | Ultra high voltage |
| UV resist | Ultra violet resist |
| UHMWPE | Ultra-high-molecular-weight polyethylene |