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. 2018 Aug 18;10(1):114–121. doi: 10.1016/j.shaw.2018.08.001

Table 2.

Chemical names frequently found in the material safety data sheets (MSDSs) of photoresist (PR) products

No. Constituent CAS no. Frequency of usage
1 Trade secret ingredients 116
2 Propylene glycol monomethyl ether acetate 108-65-6 33
3 Cyclohexanone 108-94-1 11
4 Propylene glycol monomethyl ether 107-98-2 7
5 2-Heptanone 110-43-0 7
6 Ethyl 3-ethoxypropionate 763-69-9 7
7 Other ingredients 57
Total ingredients 238

CAS, Chemical Abstracts Service.

Trade secret ingredients are shown in Table 3.

Other ingredients are shown in Supplementary table 1.