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. 2019 Mar 26;9:5139. doi: 10.1038/s41598-019-41582-7

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© The Author(s) 2019

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Selection profile of hydrophobic residues for the Rev Oligomerization Domain (OD) in the CDMS dataset¹⁰. (A) Residues from the Rev OD involved in monomer, dimer or oligomer interface packing. Structures from PDBID 3LPH and 2 × 7 L were used to generate the images. (B) Amino acid preferences for important Rev OD contact residues using CDMS fitness values¹⁰. All residues display selection against polar/charged (C,S,T,Q,N,D, E, H, R, K) residues (and stop codons) (green) while some prefer large, hydrophobic side chains (teal) over aromatics (blue). Note change of scaling for Y23.