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. 2018 Dec 3;3(3):1800058. doi: 10.1002/gch2.201800058

Figure 1.

Figure 1

a) Schematic illustration for the deposition of VO2 nanofilm on substrate synthesized by reactive sputtering of metallic V target with O2 gas introduction under a heating condition. AFM images of the surfaces of b) VO‐1, c) VO‐2, and d) VO‐3 samples. e) XRD patterns of the samples VO‐0, VO‐1, VO‐2, and VO‐3.