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Post-CMOS pocess flow for on-chip RTIL-based sensor fabrication: Photoresist is spin-coated (a) and developed (b). Titanium and gold is deposited by PVD (c). Photoresist is then rinsed off to leave the electrode (d). CMOS chip with on-chip electrode is wire bonded to package (e). A droplet of RTIL is casted on the electrodes (f).
