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. 2019 Mar 29;9:5368. doi: 10.1038/s41598-019-41859-x

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© The Author(s) 2019

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Structure of unitcell. (a) The overview of unitcell, nanocuboid GST is settled on ITO conductive layer and substrate SiO₂, periodic p = 0.7 μm, GST height h = 0.7 μm, length l = 0.35 μm, width w = 0.1 μm. ITO film thickness T = 0.03 μm. The insert is the side view of the unitcell. (b) The overlook of the unitcell, the orientation direction of structure have an angle θ with x axis.