Table 1. Various photonic integration platforms.
| PIC technology | Silicon PIC | GaAs PIC | InP PIC | Silica PIC |
|---|---|---|---|---|
| Leveraging technologies | Leverages Silicon CMOS industry | Leverages GaAs HBT industry | Leverages InP HBT industry | No electronics industry |
| Photonic–electronic integration | ‘Silicon CMOS photonics’ | ‘GaAs OEIC’ | ‘InP OEIC’ | Independent |
| Waveguide confinement | Strong confinement, Si/SiO2 | Medium confinement GaAs/AlGaAs | Medium confinement InP/InGaAsP | Weak confinement GeO2, and so on doping |
| Typical MFD | <0.5 micron confinement | >2 micron confinement | >2 micron confinement | >5 micron confinement |
| Optical gain and optical modulation | No gain, no Pockel’s effect | Efficient gain, strong Pockel’s effect | Efficient gain, strong Pockel’s effect | No gain, no Pockel’s effect |
| Wafer size | ⩾300 mm wafers | ⩾200 mm wafers | ⩾100 mm wafers | ⩾200 mm wafers |
Abbreviations: CMOS, complementary metal-oxide-semiconductor; HBT, heterojunction bipolar transistor; PIC, photonic integrated circuits.