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. 2017 Sep 11;3:17053. doi: 10.1038/micronano.2017.53

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Copyright © 2017 The Author(s)

This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/

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Optical micrograph of as-exfoliated 15 μm-sized, 20 nm-thick MoS₂ mesas and untargeted MoS₂ layers, which are exfoliated due to the poor exfoliation selectivity between the pre-patterned (or targeted) and unpatterned (or untargeted) MoS₂ layers. This poor selectivity is usually observed when the aspect ratio of pre-patterned to-be-exfoliated MoS₂ structures is close to or smaller than the critical value.